Pattern generator for nano lithography
Expand the lithography function of your SEM.
The origin of RAITH's establishment, "ELPHY," is the world's most accomplished pattern generator. It supports a wide range of applications, from simple single-field drawings to complex and automated multi-layer and multi-field patterning and measurement. It is an accessory that adds nano-lithography capabilities while maintaining the original functions of existing SEM/FIB-SEM systems. By adopting RAITH's software platform "RAITH Nanosuite," it seamlessly integrates everything from CAD layout creation to automatic exposure and measurement. • System control, pattern and job preparation, automation • Seamless integration from CAD layout to automatic exposure and automatic measurement • Equipped with a professional-grade GDSII-compatible integrated design editor/viewer • Support for true 3D nano fabrication • Option to add Proximity Effect Correction (PEC) functionality • Advanced drawing strategy definition and setting capabilities • High-precision overlay/multi-layer lithography support
- Company：伯東 本社
- Price：Other
